NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. SECTION B, BEAM INTERACTIONS WITH MATERIALS AND ATOMS

Rivista

Codice:

E122738

ISSN:

0168-583X

Dati Generali

Pubblicazioni (303)

"Disorder creation and annealing in Hg implanted CdTe

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14N(?,p)17O nuclear reaction cross-section at 4.9-6.1 MeV

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2 MeV Si Ion Implantation Damage in Relaxed Si1-xGex

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2 MeV Si ion implantation damage in relaxed Si1-xGex

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2-DIMENSIONAL PROFILING BY SELECTIVE ETCHING - THE ROLE OF IMPLANT INDUCED SECONDARY DEFECTS

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3D Structure of liquid sprays: X-ray u-radiography and tomography by polycapillary based technique

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57Fe Mössbauer studies on 57Mn* implanted InP and InAs

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⁵⁷Fe Mössbauer studies on ⁵⁷Mn* implanted InP and InAs

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A Theoretical investigation on the chemical bonding of interstitial and vacancy defects in silicon during their migration

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A kinetic lattice Monte-Carlo approach to the evolution of boron in silicon

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A lattice kinetic Monte Carlo code for the description of vacancy diffusion and self-organization in Si

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A low energy ion scattering investigation of the structure of bilayer islands of nanometric size in the initial stages of growth of iron on Cu3Au (001)

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A multi-scale atomistic study of the interstitials agglomeration in crystalline Si

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A straightforward experimental method to evaluate the Lamb-Mossbauer factor of a Co-57/Rh source

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A study of He+ ion-induced damage in silicon by quantitative analysis of charge collection efficiency data

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A velocity map imaging apparatus for gas phase studies at FERMI@Elettra

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AFM anodization studied by spectromicroscopy

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Acceleration with self-injection for an all-optical radiation source at LNF

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Active waveguides produced in lithium fluoride by He+ implantation

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Amorphous-crystalline interface evolution during Solid Phase Epitaxy Regrowth of SiGe films amorphized by ion implantation

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An EXAFS investigation of arsenic shallow implant activation in silicon after laser sub-melt annealing

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An enhanced approach to numerical modeling of heavily irradiated silicon devices

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An investigation of the structure of liquid Zn by X-ray absorption spectroscopy

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Analysis of ion implanted Silicon by RBS-channeling: influence of the damage model.

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Analysis of ion implanted silicon by RBS-channeling: influence of the damage model

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Angular distribution and expansion of laser ablation plumes measured by fast intensified charge coupled device photographs

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Assessment of the weathering effects on cellulose based materilas trough a multianalytical approach

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Atomic force microscopy on SiO2 layers grown on Ge implanted silicon

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Atomistic simulation of ion channeling in heavily doped Si : As

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B diffusion and activation phenomena during post-annealing of C co-implanted ultra-shallow junctions

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Benchmark measurements of non-Rutherford proton elastic scattering cross section for boron

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Binary collision approximation modeling of ion-induced damage effects in crystalline 6H-SiC

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Bombardment-induced compositional change in MgAl2O4, MgO and Al2O3

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Channeling characterization of defects in silicon: an atomistic approach

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Channeling energy loss of He2++ in Si by transmission and back-scattering measurements: Experiments and Computer modelling

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Characterization of a UV VUV light source based on a gas-target ns-laser-produced plasma

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Characterization of graphene oxide film by implantation of low energy copper ions

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Characterization of thermally treated Mo/Si multilayer mirrors with standing wave-assisted EXAFS

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Charge collection uniformity and irradiation effects of synthetic diamond detectors studied with a proton micro-beam

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Charge states distribution of 0.16-3.3 mev He ions transmitted through silicon

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Charge states distribution of 3350 kev He ions channeled in silicon

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Chemical selectivity and energy transfer mechanisms in the radiation-induced modification of polyethersulphone

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Comparative analysis of extended defects depth prof ile in silicon by Rutherford Backscattering, X-rays and electron microscopy

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Comparative study of metal and non-metal ion implantation in polymers: Optical and electrical properties

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Comparison between computed and measured response of silicon strip detectors exposed to carbon, calcium and ruthenium ion beams

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Complementary use of PIXE-alpha and XRF portable systems for the non-destructive and in situ characterization of gemstones in museums

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Complementary use of PIXE-alpha and XRF portable systems for the non-destructive and in situ characterization of gemstones in museums

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Compositional evolution of Pd-based nanoclusters under thermal annealing in ion implanted SiO2

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Crystal undulator experiment at IHEP

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DLTS and PL studies of proton radiation defects in tin-doped FZ silicon

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Damage profiles in as-implanted <100> Si crystals: strain by x-ray diffractometry versus interstitials by RBS-channeling

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Damage profiles in as-implanted silicon: Fluence dependence

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Deceleration of MeV antiprotons and muons to keV energies -- the anticyclotron A progress report

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Dechanneling by misfit dislocations in III-V semiconductor heterostructures

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Dechanneling cross section for misfit dislocations

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Defect Engineering of Advanced Semiconductor Device

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Defect engineering and micromachining of Lithium Niobate by ion implantation

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Defect evolution in ion implanted crystalline Si probed by in situ conductivity measurements

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Description of a flexible cell for in situ X-ray and far-IR characterization of the surface of powdered materials

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Desktop X-ray tomography for low contrast samples

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Determination of He electronic energy loss in Si by Monte-Carlo simulation of Rutherford backscattering-channeling spectra

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Diethynyl-thiophene adsorbed on Cu(100) investigated by NEXAFS and XPS

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Different methods for the determination of damage profiles in Si from RBS-channeling spectra: a comparison

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Diffusion and clustering of supersaturated carbon in SiGeC layers under oxidation

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Diffusion and clustering of supersaturated carbon in sigec layers under oxidation

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Diffusion of hydrogen implanted in alpha-quartz during air annealing

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Diffusion of ion beam injected self-interstitial defects in silicon layers grown by molecular beam epitaxy

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Diffusion of ion beam injected self-interstitial defects in silicon layers grown by molecular beam epitaxy

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Dopant behaviour and damage annealing in silicon implanted with 1 kev arsenic

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Dose-rate influence on the defect production in mev proton-implanted float-zone and epitaxial n-type silicon

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Dosimetry for electron Intra-Operative RadioTherapy: Comparison of output factors obtained through alanine/EPR pellets, ionization chamber and Monte Carlo-GEANT4 simulations for IORT mobile dedicate accelerator

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Dynamic Monte Carlo simulation of nonlinear damage growth during ion implamtation of crystalline silicon

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Dynamic Monte Carlo simulation of nonlinear damage growth during ion implantation of crystalline silicon

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Dynamics of void formation during implantation of Si under self-annealing conditions and their influence on dopant distribution

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EFFECTS OF THE BEHAVIOUR OF THE PROTON INDUCED ISOTOPES PRODUCTION ON THE ANALYSIS OF ANCIENT cOINS

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ELECTRICAL AND STRUCTURAL CHARACTERIZATION OF BF2+ SELF-ANNEALED IMPLANTATION

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ENERGY DEPOSITION MECHANISMS AND RADIATION-INDUCED REACTIONS IN PMDA-ODA POLYIMIDE

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ENERGY-LOSS AND EQUILIBRIUM CHARGE-DISTRIBUTION OF NITROGEN-IONS TRANSMITTED THROUGH THIN SILICONCRYSTALS

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EPR AND X-RAY-DIFFRACTION STUDY OF DAMAGE PRODUCED BY IMPLANTATION OF B IONS (50 KEV, 1 MEV) OR SI IONS (50 KEV, 700 KEV, 1.5 MEV) INTO SILICON

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ESTRA-FitEXA: A software package for EXAFS data analysis

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EVOLUTION OF LOW-FLUENCE HEAVY-ION DAMAGE IN SI UNDER HIGH-ENERGY ION IRRADIATION

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EXAFS study on Ag-doped silicate glasses irradiated with low-mass ions

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EXAFS study on metal cluster doped silica glass obtained by ion implantation procedures

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Effect of ion irradiation on the stability of amorphous Ge2Sb2Te5 thin films

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Effect of ultrasmall Au-Ag aggregates formed by ion implantation in Er-implanted silica on the 1.54 mu m Er3+ luminescence

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Effects of Ne+ and Ar+ ion bombardment on Fe/SiO2 bi-layers studied using RBS

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Effects of dopants on the amorphous-to-fcc transition in Ge2Sb2Te5 thin films

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Effects of dopants on the amorphous-to-fcc transition in Ge2Sb2Te5 thin films

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Effects of the behaviour of the proton-induced isotopes production on the analysis of ancient alloys

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Effects of the behaviour of the proton-induced isotopes production on the analysis of ancient alloys

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Efficient two-step Positronium laser excitation to Rydberg levels

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Electrical activation and lattice location of B and Ga impurities implanted in Si

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Electroluminescence properties of SiOx layers implanted with rare earth ions

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Electronic transport signatures of common defects in irradiated graphene-based systems

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Emittance dependence on anode morphology of an ion beam provided by laser ablation

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Emittance evaluation of electron beams produced by photoemission

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Energy loss and equilibrium charge distribution of nitrogen ions transmitted through thin silicon crystals

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Epitaxial recrystallization of alkali-ion implanted alpha-quartz

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Erratum: Damage profiles in as-implanted (100) Si crystals: Strain by X-ray diffractometry versus interstitials by RBS-channeling (Nucl. Instr. and Meth. B vol 120, pg 64, 1996)

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Evaluation of the excess and clustered silicon profiles in a silicon implanted SiO2 layer

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Experimental set-up for time resolved small angle X-ray scattering studies of nanoparticles formation using a free-jet micromixer

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External micro-PIXE analysis of fluid inclusions: Test of the LABEC facility on samples of quartz veins from Apuan Alps (Italy).

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Fabrication of channel waveguides in Er3+-doped tellurite glass via N+ ion implantation

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Fabrication of optical channel waveguides in crystals and glasses using macro- and micro ion beams

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Flash lamp annealing with millisecond pulses for ultra-shallow boron profiles in silicon

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Fluorescence from the collimator in Si-PIN and Si-Drift detectors: problems and solutions for the XRF analysis of archaeological and historical materials

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Fluorine in Ge: Segregation and EOR-defects stabilization

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Fluorine incorporation during Si solid phase epitaxy

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Formation and structure of Sn and Sb nanoclusters in thin SiO2 films

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Formation of slab waveguides in eulytine type BGO and CaF2 crystals by implantation of MeV nitrogen ions.

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Formation, evolution and annihilation of interstitial clusters in ion implanted Si

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Geant4 simulations of the lead fluoride calorimeter

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Geochemical processes in Venice Lagoon by PIXE technique: an overview.

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Giant radiation damage produced by the impact of heavy molecular ions onto silicon single crystal

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Growth and oxidation of Na on Ag(001): a MDS study

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He implantation in Si for B diffusion control

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He* interaction with soft matter surfaces: Ultra thin L-cysteine films

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Heat-induced versus particle-beam-induced chemistry in polyimide

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High fe solubility in InP by high temperature ion implantation

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Highly antibacterial UHMWPE surfaces by implantation of titanium ions

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Hydrogen-related defect centers in float-zone and epitaxial n-type proton implanted silicon

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IBA study of SiGe/SiO2 nanostructured multilayers

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INTERFACE EVOLUTION AND EPITAXIAL REALIGNMENT IN POLYCRYSTAL SINGLE-CRYSTAL SI STRUCTURES

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ION CHANNELING ANALYSIS OF EXTENDED-DEFECT ANNEALING IN SILICON BY RAPID THERMAL-PROCESSES

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ION-ASSISTED CRYSTALLIZATION IN SILICON - EPITAXY AND GRAIN-GROWTH

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ION-BEAM EFFECTS ON THE SURFACE AND NEAR-SURFACE COMPOSITION OF TASI2

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ION-BEAM-INDUCED EPITAXIAL CRYSTALLIZATION OF IMPLANTED AND CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON

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In situ X-ray syncrotron study of organic semiconductor ultrathin films growth

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Incorporation of active Fe impurities in GaInP by High Temperature Ion implantation

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Incorporation of active Fe impurities in GaInP by high temperature ion implantation

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Influence of annealing atmosphere on metal and metal alloy nanoclusters produced by ion implantation in silica

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Influence of impurities on the density of states at the fermi level in the c(6 x 4)-C-60/Ag(100) two-dimensional superstructure

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Influence of impurities on the density of states at the fermi level in the c(6 × 4)-C60/Ag(1 0 0) two-dimensional superstructure

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Influence of post-implantation thermal and laser annealing on the stability of metal-alloy nanoclusters in silica

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Interaction between implanted fluorine atoms and point defects in preamorphized silicon

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International Atomic Energy Agency Intercomparison of ion beam analysis software

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Investigation of heavily damaged ion implanted Si by atomistic simulation of Rutherford backscattering channeling spectra

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Investigation on the oxidation process of SiCO glasses by the means of non-Rutherford backscattering spectrometry

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Investigations on 40 MeV Li3+ ions irradiated GaN epilayers

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Ion beam analyses and electrical characterization of substitutional Fe properties in Fe implanted InP

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Ion beam analysis of mismatched epitaxial heterostructures

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Ion beam doping and epitaxial regrowth of alpha-quartz

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Ion beam erosion of amorphous materials: evolution of surface morphology

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Ion beam erosion of graphite surfaces studied by STM: Ripples, self-affine roughening and near-surface damage accumulation

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Ion beam induced reduction of metallic cations in yttria-zirconia

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Ion beam induced transient amorphous nucleation in silicon

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Ion beam synthesis of undoped and Er-doped Si nanocrystals

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Ion channeling study of P implantation damage in CdTe

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Ion implantation doping for optoelectronic applications

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Ion implantation induced damage in relaxed Si0.75Ge0.25

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Ion irradiation of AZO thin films for flexible electronics

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Ion sculpting: A tool for tuning magnetic anisotropy in ultrathin films

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Ion sputtered surfaces as templates for carbon nanotubes alignment and deformation

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Ion transmission spectroscopy of pores filled with Au nanoparticles

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Iso-concentration study of atomistic mechanism of B diffusion in Si

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Issues on boron electrical activation in silicon: Experiments on boron clusters and shallow junctions formation

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Laser irradiations of advanced targets promoting absorption resonance for ion acceleration in TNSA regime

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Laser-plasma acceleration of electrons for radiobiology and radiation sources

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Lattice strain of B-B pairs formed by He irradiation in crystalline Si1-xBx/Si

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Leaky mode suppression in planar optical waveguides written in Er:TeO2-WO3 glass and CaF2 crystal via double energy implantation with MeV N+ ions

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Local behaviour of negative thermal expansion materials

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Local structure and electronic properties in colossally magnetoresistive thin film of La0.87Na0.13MnO3by Mn-K edge EXAFS and XANES

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Local structure and magneto-transport in Sr2FeMoO6oxides

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Local structure of Fe incorporated in GaInP layers by high temperature ion implantation

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MARISS study on ion yields of Ne+ scattered from III-V compound semiconductors

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MASK EDGE EFFECTS IN HIGH-ENERGY IMPLANTS - DOPANT AND DEFECT DISTRIBUTIONS

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Magnetic properties of Co and Ni based alloy nanoparticles dispersed in a silica matrix

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Magnetic response of Mn-doped amorphous porous Ge fabricated by ion-implantation

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Mapping of non-planar surfaces and film conformality by alpha-particle energy loss spectroscopy

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Maskless nano-implant of 20 keV Ga+ in bulk Si(1 0 0) substrates

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Materials Issues and Device Performances for Light Emitting Er-implanted Si

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MeV energy implantation of Fe in InP

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Mechanism of de-activation and clustering of B in Si at extremely high concentration

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Mechanism of de-activation and clustering of B in Si at extremely high concentration

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Mg K-edge XANES of sepiolite and palygorskite

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Micro ion beam analysis for the erosion of beryllium marker tiles in a tokamak limiter

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Micro-beam and pulsed laser beam techniques for the micro-fabrication of diamond surface and bulk structures

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Migration and interaction properties of ion beam generated point defects in c-Si

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Modification of the etching properties of x-cut Lithium Niobate by ion implantation

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Monitoring the crystallization process of nano-confined organic molecules by synchrotron X-ray diffraction

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Multi-technique characterization of gold electroplating on silver substrates for cultural heritage applications

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Multi-technique study of He+ micro-irradiation effects on natural quartz crystals contained in archaeological pottery

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Nanocluster formation in silicate glasses by sequential ion implantation procedures

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Nanocrystals manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications

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Network modification and epitaxial recrystallisation of ion-implanted alpha-quartz

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New insight on the interaction and diffusion properties of ion beam injected self-interstitials in crystalline silicon

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Ni atomic environment in epitaxial NiO layers on Ag(001)

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Nitrogen distribution during oxidation of low and medium energy nitrogen-implanted silicon

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Nuclear energy and cascade effects on the ion-assisted crystal nucleation in amorphous silicon

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ON THE DETERMINATION OF 2-DIMENSIONAL CARRIER DISTRIBUTIONS

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On the design of a monolithic 4-bounce high resolution X-ray monochromator

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Onset of magnetic anisotropy in ion-sculpted ultrathin magnetic films

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Optical Doping of Materials by Erbium Ion Implantation

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Optical and electrical doping of silicon with holmium

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Optical and electrical properties of polycarbonate matrices implanted by high energy Cu ions

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Optical transient in ion irradiated silicon carbide

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Oxygen - Impurity Interactions in Crystalline Silicon: the Cases of Aluminum and Erbium

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PIXE Analysis to Study Metal Diffusion and Sedimentation Phenomena in Venice Lagoon.

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PIXE contribution for a database of Phoenician pottery in Lebanon

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PRE-AMORPHIZATION DAMAGE STUDY IN AS-IMPLANTED SILICON

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Pd-based alloy nanoclusters in ion-implanted silica: Formation and stability under thermal annealing

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Penning de-excitation of spin-polarised metastable He atoms on magnetic surfaces: Mg on Fe

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Photofragmentation of organic molecules of biological interest: The pyrimidine and 2Br-pyrimidine cases

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Photoionization and Velocity Map Imaging spectroscopy of atoms, molecules and clusters with Synchrotron and Free Electron Laser radiation at Elettra

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Physical insight into the phenomenon of B clustering in Si at room temperature

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Pillar defects, a new type of track in Pb-irradiated Bi-2212 thin films: Nanostructural study and influence on the irreversibility line

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Plasma processing: a novel method to reduce the transient enhanced diffusion of boron implanted in silicon

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Plasma treatment of expanded PTFE offers a way to a biofunctionalization of its surface

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Point defect diffusion and clustering in ion implanted c-Si

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Point defect engineering in preamorphized silicon enriched with fluorine

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Polymer film degradation under ion irradiation studied by ion beam induced luminescence (IBIL) and optical analyses

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Polymer processing by a low energy ion accelerator

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Production of niobium titanium nitride coatings by reactive diffusion for superconducting cavity applications

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Production of waveguides in LiF by MeV ion bombardment.

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Proposal for a prototype of portable micro-XRF spectrometer

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Proposed antimatter gravity measurement with an antihydrogen beam

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Proton beams obtained by hydrogenated Al targets

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Proton extraction by laser ablation of transition metals

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Quantitative determination of depth carrier profiles in ion-implanted Gallium Nitride

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Quantitative structural refinement of Mn K edge XANES in LaMnO3and CaMnO3perovskites

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RAPID THERMAL ANNEALING OF HOT IMPLANTS IN SILICON

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RBS analysis of substoichiometric TiO2-anatase thin films for visible-light photocatalysis

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RBS-channeling analysis of ion-irradiation effects in heavily-doped Si : As

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RBS-channeling analysis of virgin 6H-SiC: Experiments and Monte Carlo simulations

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RBS-channeling determination of damage profiles in fully relaxed Si0.76Ge0.24 implanted with 2 meV Si ions

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RBS-channeling spectra: simulation of as-implanted Si samples through an empirical formula for <100> axial dechanneling of He in silicon

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Radiocarbon dating versus volcanic event stratigraphy: Age modelling of Quaternary marine sequences in the coastal region of the Eastern Tyrrhenian Sea

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Radiocarbon dating versus volcanic event stratigraphy: age modelling of Quaternary marine sequences in the coastal region of the Eastern Tyrrhenian Sea

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Random and channeling stopping power of nitrogen in silicon in the 700-1500 keV range

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Reaction of Al with ammonia by pulsed laser ablation: Optical analysis and mass spectrometry

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Relaxed state of GexSi1xislands embedded in Si

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Results and perspectives in hard X-ray photoemission spectroscopy (HAXPES) from solids

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Results and perspectives in hard X-ray photoemission spectroscopy (HAXPES) from solids

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Role of Si self-interstitials on the electrical de-activation of B doped Si

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Role of self-interstitials on B diffusion in Ge

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Roman bronze artefacts from Thamusida (Morocco): Chemical and phase analyses

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Room Temperature Light Emitting Silicon Diodes Fabricated by Erbium Ion Implantation

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Room temperature defect diffusion in ion implanted c-Si

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Room temperature migration of ion beam injected point defects in crystalline silicon

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Selective binding of oligonucleotide on TiO2 surfaces modified by swift heavy ion beam lithography

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Self-interstitial diffusion and clustering with impurities in crystalline silicon

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Self-interstitial diffusion and clustering with impurities in crystalline silicon

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Self-organization of Au nanoclusters on the SiO2 surface induced by 200 keV-Ar+ irradiation

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Semi-insulating behaviour in Fe MeV implanted n-type InP

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Sequential ion implantation of copper and cobalt in silica glass: A study by synchrotron radiation techniques

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Si nanocrystals formation by a new ion implantation device

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Si-based materials for advanced microelectronic devices: Synthesis, defects and diffusion

Capitolo di libro

Si/GexSi1-x heterojunction bipolar transistors formed by Ge ion implantation in Si. Narrowing of band gap and base width

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Silver nanocluster formation in ion-exchanged glasses by annealing, ion beam and laser beam irradiation: An EXAFS study

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Single- and double energy N+ ion irradiated planar optical waveguides in Er: Tungsten-tellurite oxide glass and sillenite type Bismuth Germanate crystals working up to telecommunications wavelengths

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Size dependent hcp-to-fcc transition temperature in Co nanoclusters obtained by ion implantation in silica

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Sparc_Lab present and future.

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Spectro-microscopy of ultra-thin SiN films on Si (111)

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Spin-polarised metastable atom de-excitation at alkali-covered magnetic surfaces: Na on Fe/Ag(001)

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Stopping power of SiO2 for 0.2-3.0 MeV He ions

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Stopping power of sio2 for 0.2?3.0 mev He ions

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Strain field reconstruction in shallow trench isolation structures by CBED and LACBED

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Structural and magnetic properties of Fe-Al silica composites prepared by sequential ion implantation

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Structural modifications and electrical properties in ion-irradiated polyimide

Contributo in Atti di convegno

Structural modifications and electrical properties in ion-irradiated polymide

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Structural modifications induced by swift heavy ions in thin films of yttria fully stabilized zirconia

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Structure and thermal stability of Au-Fe alloy nanoclusters formed by sequential ion implantation in silica (vol 250, pg 225, 2006)

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Studies on nitridation of laser evaporated III-IV group elements with gaseous ammonia and thin film deposition

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Submicron-scale patterns on ferromagnetic-antiferromagnetic Fe/NiO layers by focused ion beam (FIB) milling

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Summary of IAEA intercomparison of IBA software

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Surface magnetism during the early stages of oxygen-assisted growth of Cr on Fe(001): a SPMDS study

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Synchrotron X-ray investigation of tetracene thin films grown at different deposition fluxes

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Synchrotron radiation glancing incidence X-ray diffraction: a tool for structural investigations of ion implanted glasses

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Synchrotron radiation photoionization mass spectrometry of laser ablated species

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Synchrotron radiation studies of additives in combustion I: Water

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Synthesis of wide band gap nanocrystals by ion implantation

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Tailoring of silicon crystals for relativistic-particle channeling

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Temperature dependence of rippled corrugations induced on the Rh(110) surface via ion sputtering

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The Analysis of Bronze Alloys from the Equestrian Statue of Marco Aurelio by Means of a Thin Sample XRF Technique

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The As2V complex in silicon: Band-gap levels, migration and annealing

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The Fe/NiO interface studied by polarization dependent X-ray absorption spectroscopy

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The LILIA (laser induced light ions acceleration) experiment at LNF

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The Legnaro ion microprobe in low current experiments

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The Si surface yield as a calibration standard for RBS

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The center for production of single-photon emitters at the electrostaticdeflector line of the Tandem accelerator of LABEC (Florence)

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The damage recovery and electrical activation of shallow boron implants in silicon: The effects of high energy implants

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The effect of thermal treatments on the local geometry around indium in In and In+C high dose implanted Si

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The elastic (3)He+d cross section of relevance for knock-on effects in radio frequency heated ((3)He)D plasmas

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The influence of Cr-composition on the local magnetic structure of FeCr alloys

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The study of structural properties of 100 keV hydrogen ion implanted semi-insulating GaAs single crystals

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The symmetry of the Be(0001) surface states as determined by ARPES with variable polarization synchrotron radiation

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Time resolved photoluminescence associated with non-bridging oxygen hole centers in irradiated silica.

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Time scales of transient enhanced diffusion: Free and clustered interstitials

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Trace Metal Distribution in Aquatic System as Studied by PIXE Analysis of Water and Sediment

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Trace metal behaviour during salt and fresh water mixing in the Venice Lagoon

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Transmission diffractive patterns of large microchannel plates at soft X-ray energies

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Ultra-shallow junction by laser annealing: Integration issues and modelling

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Ultra-shallow junction by laser annealing: integration issues and modelling

Contributo in Atti di convegno

Ultra-shallow junction formation by excimer laser annealing and low energy (<1 keV) B implantation: Atwo-dimensional analysis

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X-RAY DETERMINATION OF LATTICE DAMAGE DEPTHPROFILES DUE TO ELECTRONIC AND NUCLEAR-ENERGY LOSSES IN SILICON IMPLANTED WITH MEV BORON IONS

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X-RAY-DIFFRACTION ANALYSIS OF DAMAGE ACCUMULATION DUE TO THE NUCLEAR-ENERGY LOSS OF 50 KEV AND 1-2.2 MEV B IONS IMPLANTED IN SILICON

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X-ray absorption spectroscopy study of Yb2O3 and Lu2O3 thin films deposited on Si(100) by atomic layer deposition

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X-ray absorption spectroscopy study of Yb2O3and Lu2O3 thin films deposited on Si(100) by atomic layer deposition

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X-ray determination of lattice damage depth-profiles due to electronic and nuclear energy losses in silicon implanted with MeV boron ions

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X-ray induced variation of the chemistry of GaAs/AlAs oxide nanostructures

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X-ray micro-beam techniques and phase contrast tomography applied to biomaterials

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XPS study of radiation-induced modification of poly(butene-1-sulfone): Dependence on the energy deposition mechanism

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XRF analysis of Roman Imperial Coins

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No Results Found