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Review of technology for normally-off HEMTs with p-GaN gate

Articolo
Data di Pubblicazione:
2018
Abstract:
Owing to the high carrier density and high electron mobility of the two dimensional electron gas (2DEG), high electron mobility transistors (HEMTs) based on gallium nitride (GaN) are suitable devices for high power and high frequency applications. Clearly, the presence of the 2DEG at the interface of AlGaN/GaN heterostructures makes HEMTs intrinsically normally-on devices. However, for power electronics applications, normally-off operation is desired for safety reasons and to simplify the driver circuitry. In this context, although several approaches to obtain normally-off transistors have been reported in the literature, normally-off GaN-based HEMTs with a p-GaN gate is among the most promising and the only commercially available today.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Normally-off HEMT; P-GaN; AlGaN/GaN heterostructures
Elenco autori:
Roccaforte, Fabrizio; Greco, Giuseppe
Autori di Ateneo:
GRECO GIUSEPPE
ROCCAFORTE FABRIZIO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/349334
Pubblicato in:
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Journal
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