XRD and EXAFS studies of HfO2 crystallisation in SiO2-HfO2 films

Academic Article

Publication Date:

2006

Iris type:

01.01 Articolo in rivista

List of contributors:

Armellini, Cristina; Jestin, Yoann; Rocca, Francesco

Handle:

https://iris.cnr.it/handle/20.500.14243/42191

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Journal