Exchange Bias in fcc-CoPt/CoO/Si films as a function of annealing treatment

Articolo

Data di Pubblicazione:

2009

Abstract:

The investigation on the interface properties of fcc-CoPt/CoO thin films grown by Pulsed Laser Deposition is presented. The structural and microstructural properties of the CoO antiferromagnetic layer have been modulated by thermal treatments in order to investigate their influence on the magnetic behavior of the system.

Tipologia CRIS:

01.01 Articolo in rivista

Keywords:

Exchange Bias; fcc-CoPt/CoO/Si films; PLD; annealing treatment

Elenco autori: