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A comparative analysis of silicon dioxide films deposited by ECR-PECVD, TEOS-PECVD and Vapox-APCVD
Academic Article
Publication Date:
2006
Iris type:
01.01 Articolo in rivista
List of contributors:
Pecora, Alessandro; Fortunato, Guglielmo
Authors of the University:
PECORA ALESSANDRO
Handle:
https://iris.cnr.it/handle/20.500.14243/21052
Published in:
JOURNAL OF NON-CRYSTALLINE SOLIDS
Journal
