Annealing effect on optical barrier in ion-implanted tellurite glass waveguides
Contributo in Atti di convegno
Data di Pubblicazione:
2009
Abstract:
Slab waveguides were fabricated in tellurite glasses by means of nitrogen ion implantation, using a wide range of ion doses (from 5x1012 to 8x1016 ions/cm2), in order to investigate their effects on the induced refractive index change. The results of the characterization, carried out by means of dark-line spectroscopy, show the presence of an optical barrier with a decrease of the refractive index at the end of range. Annealing post-implantation process was performed at different temperatures on higher doses (>= 1016 ions/cm2) ion implanted slab waveguides and the characterization showed a decrease of the barrier effect probably due to a corresponding reduction of the defects inside the glass matrix. © 2009 SPIE.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Keywords:
Annealing effects; Barrier effects; End of ranges; Er3+ -doped glasses; Glass mat; Induced refractive index; Ion beam irradiation; Ion dose; Ion implanted; Nitrogen ion implantations; Post-implantation; Slab waveguides; Tellurite glass; Annealing; Erbium; Integrated optics; Ion beams; Ion bombardment; Ion implantation; Light refraction; Optical materials; Photonics; Refractive index; Refractometers; Tellurium compounds; Waveguides; Glass
Elenco autori:
Righini, Giancarlo; Pelli, Stefano; NUNZI CONTI, Gualtiero; Berneschi, Simone
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