Optical and structural characterization of Erbium-doped ion-implanted tellurite glasses for active integrated optical devices

Erbium-doped tellurite glasses show great potential for the fabrication of high-performance integrated optical amplifiers and lasers, thanks to their unique properties in terms of bandwidth and rare earth solubility. As a first step towards the development of smart multi-functional integrated optical circuits, the fabrication of multimode channel waveguides in a sodium-tungsten-tellurite glass, by using nitrogen ions implantation, has been recently demonstrated [1]. The effects of the ion implantation process, however, have not been fully clarified, and a deeper investigation would be necessary in order to optimize the process and to truly exploit the glass useful characteristics. We therefore report here the results of a broad optical, topographic, and structural characterization of tellurite samples irradiated with various doses of nitrogen ions, while keeping constant the beam energy at 1.5 MeV. Characterization techniques have included absorption and luminescence spectroscopy, modal (dark-line) spectroscopy, surface profilometry, scanning electron microscopy, cathodoluminescence spectroscopy and EDX analysis. © 2008 Trans. Tech. Publications, Switzerland.