EXTENDED DEFECT REMOVAL IN SILICON BY RAPID THERMAL ANNEALING

Academic Article

Publication Date:

1990

Iris type:

01.01 Articolo in rivista

List of contributors:

Calcagno, Lucia; Rimini, Emanuele; Coffa, Salvatore; Spinella, ROSARIO CORRADO

Authors of the University:

SPINELLA ROSARIO CORRADO

Handle:

https://iris.cnr.it/handle/20.500.14243/19389

Published in:

NUOVO CIMENTO DELLA SOCIETÀ ITALIANA DI FISICA. D CONDENSED MATTER, ATOMIC, MOLECULAR AND CHEMICAL PHYSICS, BIOPHYSICS (TESTO STAMP.)

Journal