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ION CHANNELING ANALYSIS OF EXTENDED-DEFECT ANNEALING IN SILICON BY RAPID THERMAL-PROCESSES
Academic Article
Publication Date:
1990
Iris type:
01.01 Articolo in rivista
List of contributors:
Calcagno, Lucia; Rimini, Emanuele; Coffa, Salvatore; Spinella, ROSARIO CORRADO
Authors of the University:
SPINELLA ROSARIO CORRADO
Handle:
https://iris.cnr.it/handle/20.500.14243/19372
Published in:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. SECTION B, BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Journal
