INFLUENCE OF A THIN INTERFACIAL OXIDE LAYER ON THE ION-BEAM ASSISTED EPITAXIAL CRYSTALLIZATION OF DEPOSITED SI

Academic Article

Publication Date:

1988

Iris type:

01.01 Articolo in rivista

List of contributors:

Priolo, Francesco; Rimini, Emanuele; Spinella, ROSARIO CORRADO

Authors of the University:

SPINELLA ROSARIO CORRADO

Handle:

https://iris.cnr.it/handle/20.500.14243/19335

Published in:

APPLIED PHYSICS LETTERS

Journal