Data di Pubblicazione:
2019
Abstract:
We analyze a phase-field approximation of a sharp-interface model for two-phase materials proposed by Silhavy (in: Hackl (ed) IUTAM symposium on variational concepts with applications to the mechanics of materials, pp 233-244, Springer, Dordrecht, 2010; J Elast 105:271-303, 2011). The distinguishing trait of the model resides in the fact that the interfacial term is Eulerian in nature, for it is defined on the deformed configuration. We discuss a functional frame allowing for the existence of phase-field minimizers and Gamma-convergence to the sharp-interface limit. As a by-product, we provide additional detail on the admissible sharp-interface configurations with respect to the analysis in Silhavy (2010, 2011).
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
N/A
Elenco autori:
Stefanelli, ULISSE MARIA
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