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Local electrical properties of the 4H-SiC(0001)/graphene interface

Articolo
Data di Pubblicazione:
2011
Abstract:
Local current transport across graphene/4H-SiC was studied with nanometric scale lateral resolution by Scanning Current Spectroscopy on both graphene grown epitaxially on 4H-SiC(0001) (EG-SiC) and graphene exfoliated from highly oriented pyrolitic graphite and deposited on 4H-SiC(0001) (DG-SiC). The study revealed that the Schottky banier height (SBH) of EG/4H-SiC(0001) is lowered by ~0.49eV. This is explained in terms of Fermi-level pinning above the Dirac point in EG due to the presence of positively charged states at the interface between Si face of 4H-SiC and carbon-rich buffer layer. Furthermore, Scanning Capacitance Spectroscopy based method allowed evaluating local electron mean free path (l gr) in graphene. l gr in EG-SiC was observed to be, on average, ~0.4 times that in DG-SiC and exhibited large point-to-point variations due to presence of laterally homogeneous positively charged buffer layer at the interface. However, l gr in graphene on SiC was observed to be larger than on standard SiO 2 samples (DG-SiO 2), which is explained by better dielectric screening of charged impurities and lower surface polar phonon scattering at the graphene/substrate interface. (c) (2011) Trans Tech Publications.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Carbon rich; Charged impurity; Current transport; Dielectric screening; Dirac point; Electrical property; Electron mean free path; Fermi level pinning; Highly oriented pyrolitic graphites; Lateral resolution; Local electron mean free path; Nanometric scale; Positively charged; Scanning capacitance spectroscopy; Schottky; Buffer layers; Capacitance; Capacitance measurement; Graphene; Scanning; Semiconductor metal boundaries; Silicon carbide; Silicon oxides; Semiconducting silicon compounds
Elenco autori:
Sonde, SUSHANT SUDAM; Vecchio, Carmelo; Rimini, Emanuele; Raineri, Vito; Giannazzo, Filippo
Autori di Ateneo:
GIANNAZZO FILIPPO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/247206
Pubblicato in:
MATERIALS SCIENCE FORUM
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