"Low Temperature Deposition of SiNx Thin Films by the LPCVD Method"

Academic Article

Publication Date:

2012

Iris type:

01.01 Articolo in rivista

Keywords:

silicon nitride; thin film; LPCVD method; Raman; FTIR

List of contributors:

Ristic, Davor; Righini, Giancarlo; Ferrari, Maurizio; Chiasera, Alessandro

Authors of the University:

CHIASERA ALESSANDRO

RIGHINI GIANCARLO

Handle:

https://iris.cnr.it/handle/20.500.14243/11698

Published in:

CROATICA CHEMICA ACTA

Journal