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The early oxynitridation stages of hydrogen-terminated (100) silicon after exposure to N-2 : N2O. Nitrogen bonding states

Articolo
Data di Pubblicazione:
2002
Abstract:
Nitridation of hydrogen-terminated silicon in a diluted N2 : N2O atmosphere was studied by X-ray photoemission spectroscopy and high-resolution electron microscopy. Our analysis showed that the broad N(1s) peak of width 1.5 eV at 398-399 eV, usually reported in the literature, is preceded by the formation of a narrow peak of width around 1.0 eV at 397.5 eV, attributed to the moiety Si3N in which silicon is only marginally oxidized, and two other peaks at 400.0 eV and 401.5 eV, attributed to the moieties Si2NOSi and SiNO, respectively.
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Bongiorno, Corrado; Spinella, ROSARIO CORRADO
Autori di Ateneo:
BONGIORNO CORRADO
SPINELLA ROSARIO CORRADO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/52452
Pubblicato in:
APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING
Journal
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