Collective behavior of block copolymer thin films within periodic topographical structures

Academic Article
Publication Date:
2013
abstract:
We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71
Iris type:
01.01 Articolo in rivista
List of contributors:
Authors of the University:
Handle:
https://iris.cnr.it/handle/20.500.14243/218141
Published in:
NANOTECHNOLOGY (BRISTOL, ONLINE)
Journal