Collective behavior of block copolymer thin films within periodic topographical structures

Articolo
Data di Pubblicazione:
2013
Abstract:
We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Autori di Ateneo:
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/218141
Pubblicato in:
NANOTECHNOLOGY (BRISTOL, ONLINE)
Journal