Data di Pubblicazione:
1999
Abstract:
The adsorption of germanium on the Bi/Si(001)-(2 × 5) surface [bismuth saturation coverage of 0.7 ML (monolayers)] was investigated by core-level photoemission spectroscopy. At submonolayer germanium coverage, the presence of a bulk component largely dominating the Ge 3d core level demonstrates that the favourite adsorption sites are the bismuth-terminated terraces, where Ge-Bi site exchange takes place. At larger germanium coverage, in addition to the previous process, the occurrence of a pure germanium epitaxy is indicated by the presence of the (2 × 1) surface components in the Ge 3d core level.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Adsorption; Bismuth; Crystal lattices; Electron energy levels; Epitaxial growth; Germanium; Photoelectron spectroscopy; Semiconducting silicon; Surface structure; High resolution core level spectroscopy; Lattice mismatch; Interfaces (materials)
Elenco autori:
Perfetti, Paolo; DE PADOVA, IRENE PAOLA; Larciprete, Rosanna; Ottaviani, Carlo; Priori, Sandro
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