Plasma Deposition of Hydrofluorinated Amorphous Silicon-Carbon Alloys

Hydrofluorinated amorphous silicon-carbon alloys (a-SiC:H,F) are obtained by plasma decomposition of SiF4-CH4-H2 mixture. Small addition of CH4 to SiF4-H2 mixture produces silicon carbon alloys with C incorporation up to 70%. In this contribute, we report results on the joined analysis of the plasma phase carried out by mass spectrometry (MS), and of the resultant material, by Fourier Transform InfraRed spectroscopy (FTIR) and X-ray Photoelectron Spectroscpy (XPS), in order to get information about the film growth chemistry.