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Two silicon optical modulators realizable with a fully compatible bipolar process

Articolo
Data di Pubblicazione:
1998
Abstract:
In this paper, we describe two different kinds of silicon optical modulators both integrated into a silicon on silicon optical channel waveguide which can be realized using a standard bipolar process. The possibility of using standard, well-known technology presents several advantages with respect to III-V optoelectronics. The first device presented is based on a three-terminal active device and exploits the plasma dispersion effect to achieve the desired modulation. The active device used is a bipolar mode field effect transistor; we show how the introduction of the third control terminal introduces some definite advantages with respect to commonly p-i-n driven modulators. The second is an electrically controlled Bragg reflector. In this case, although controlled by a p-i-n diode, fast switching speed is achieved because lower injection levels are required. Numerical simulations and preliminary experimental results are presented on both devices.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Bipolar transistors; Computer simulation; Diffraction gratings; Field effect transistors; Integrated optoelectronics; Optical waveguides; Optoelectronic devices; Semiconducting silicon; Semiconductor diodes; Bragg reflectors; Plasma dispersion effect; Light modulators
Elenco autori:
Iodice, Mario
Autori di Ateneo:
IODICE MARIO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/217676
Pubblicato in:
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
Journal
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http://www.scopus.com/inward/record.url?eid=2-s2.0-0032207956&partnerID=40&md5=673d3b6081fe0efa49405525ec440ea7
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