High density electron emission source based on carbon nanotubes for industrial applications

Vertically aligned multi-walled carbon nanotubes (MWCNTs) have been grown by Catalyzed-Chemical Vapour Deposition (C-CVD) both on bare doped silicon and thin TiN film on silicon, using iron and nickel as catalyst, respectively. The aim is the development of high density and stable cold emission sources for industrial applications. Field emission characteristics of MWCNTs have been evaluated, obtaining current densities up to 150 mA/cm(2) at applied electrical field of 6 V/mu m. Emission measurements have been performed which prove a medium-term stability. Structural and morphological characterization of MWCNTs has been carried out by SEM and Raman spectroscopy.