Reactive ion etching characterization of a-SiC: H in CF4/O2 plasma

Academic Article
Publication Date:
1995
abstract:
[object Object]
Iris type:
01.01 Articolo in rivista
Keywords:
Amorphous material; RIE; Etching; Silicon carbide
List of contributors:
Handle:
https://iris.cnr.it/handle/20.500.14243/299165
Published in:
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Journal