Data di Pubblicazione:
1994
Abstract:
Tungsten tips obtained through electrochemical etching have been characterized by scanning electron microscopy, scanning Auger microscopy, and scanning tunneling microscopy. While such tips resulted to be very sharp, a thick oxide layer (~10 nm) is present at the apex. High-vacuum annealing at 1800 K removes most of such oxide.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
STM TUNGSTEN ANNEALING SPATIAL RESOLUTION HIGH VACUUM AUGER ELECTRON SPECTROSCOPY ETCHING USES SURFACE CONTAMINATION
Elenco autori:
Paparazzo, Ernesto; Cricenti, Antonio; Selci, Stefano
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