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Deep level investigation on n-In0.35Ga0.65As/GaAs structures

Academic Article
Publication Date:
1998
abstract:
We have investigated the deep electronic levels in n-In0.35Ga0.65As epitaxial layers grown by molecular beam epitaxy (MBE) on graded InxGa1-xAs buffer/GaAs structures. InxGa1-xAs buffer layers with linear, parabolic and power composition grading law, respectively have been considered. The dependence of the deep levels distribution on the buffer grading law as well as on growth parameters such as the growth temperature and use of As-2 or As-4 beams is reported.
Iris type:
01.01 Articolo in rivista
Keywords:
MOLECULAR-BEAM EPITAXY; MISFIT DISLOCATIONS; GAAS; HETEROSTRUCTURES; ELECTRON STATES; TRAPS
List of contributors:
Bosacchi, Antonio; Franchi, Secondo; Gombia, Enos; Nasi, Lucia; Motta, Alberto; Mosca, Roberto
Authors of the University:
MOSCA ROBERTO
NASI LUCIA
Handle:
https://iris.cnr.it/handle/20.500.14243/210398
Published in:
SOLID-STATE ELECTRONICS
Journal
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URL

http://www.sciencedirect.com/science/article/pii/S0038110197002256
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