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Deep level investigation on n-In0.35Ga0.65As/GaAs structures

Articolo
Data di Pubblicazione:
1998
Abstract:
We have investigated the deep electronic levels in n-In0.35Ga0.65As epitaxial layers grown by molecular beam epitaxy (MBE) on graded InxGa1-xAs buffer/GaAs structures. InxGa1-xAs buffer layers with linear, parabolic and power composition grading law, respectively have been considered. The dependence of the deep levels distribution on the buffer grading law as well as on growth parameters such as the growth temperature and use of As-2 or As-4 beams is reported.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
MOLECULAR-BEAM EPITAXY; MISFIT DISLOCATIONS; GAAS; HETEROSTRUCTURES; ELECTRON STATES; TRAPS
Elenco autori:
Bosacchi, Antonio; Franchi, Secondo; Gombia, Enos; Nasi, Lucia; Motta, Alberto; Mosca, Roberto
Autori di Ateneo:
MOSCA ROBERTO
NASI LUCIA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/210398
Pubblicato in:
SOLID-STATE ELECTRONICS
Journal
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http://www.sciencedirect.com/science/article/pii/S0038110197002256
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