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The influence of the DX center on the capacitance of Schottky barriers in n-type A1GaAs

Articolo
Data di Pubblicazione:
1991
Abstract:
The significance of both the density N, and the apparent built-in voltage V(a), as usually obtained from C-V measurements on Schottky barriers containing DX centers, is clarified. It is also shown that, owing to the non-equilibrium occupancy of the DX center, at low temperature the electron density in the flat-band region depends on the cooling rate of the sample
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
MOLECULAR-BEAM EPITAXY; SI-DOPED AL(x)GA(1-x)AS; DEEP DONORR
Elenco autori:
Bosacchi, Antonio; Franchi, Secondo; Gombia, Enos; Mosca, Roberto
Autori di Ateneo:
MOSCA ROBERTO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/188740
Pubblicato in:
APPLIED SURFACE SCIENCE
Journal
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