Data di Pubblicazione:
1993
Abstract:
The electron ionization mass spectrometric behaviour of a new class of hafnocene dialcoholates, and, for comparison, of hafnocene dichloride, is discussed. They are also compared on the basis of mass-analysed ion kinetic energy spectrometry. Fragmentation patterns of oxygen-containing species give relevant information on their potential as precursors for the deposition of HfO2 thin films via metal-organic chemical vapour deposition.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
CHEMICAL VAPOR-DEPOSITION; THIN-FILMS; ZIRCONIUM; COMPLEXES; TITANIUM
Elenco autori:
Favretto, Donata; Porchia, Marina; Rossetto, GILBERTO LUCIO
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