Data di Pubblicazione:
2005
Abstract:
GaN(0001) epilayers were fabricated by rf-plasma enhanced molecular beam epitaxy on GaN templates. The templates were grown by metalorganic chemical vapor deposition on sapphire. The layers exhibited the 2 x 2 reconstruction of the Ga-face during growth and the 1 x 1 reconstruction upon cooling. On such surfaces, AUn-GaN and Au/n-GaN junctions were fabricated in-situ by molecular beam epitaxy. X-ray photoemission spectroscopy studies allowed us to determine n-type Schottky barrier heights of 0.61 +/- 0.06 and 0.98 +/- 0.06 eV, respectively, for the two types of epitaxial junctions
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Passaseo, ADRIANA GRAZIA
Link alla scheda completa:
Pubblicato in: