CVD Cu2O and CuO nanosystems characterized by XPS

In the present investigation, X-ray Photoelectron (XPS) and X-ray Excited Auger Electron Spectroscopy (XE-AES) analyses of the principal core levels (O1s, Cu2p, and CuLMM) of Cu2O and CuO nanosystems are proposed. The samples were obtained by Chemical Vapor Deposition (CVD) starting from a novel second-generation copper(II) precursor, Cu(hfa)2oTMEDA (hfa=1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA=N,N,N',N'-tetramethylethylenediamine), under a dry O2 atmosphere. The obtained route led to pure, homogeneous and single-phase Cu(I) and Cu(II) oxide nanosystems at temperatures of 300 and 500°C, respectively, whose chemical nature could be conveniently distinguished by analyzing the Cu2p band shape and position, as well as by evaluating the Auger parameters. The samples were characterized by O/Cu atomic ratios greater than the expected stoichiometric values, due to marked interactions with the outer atmosphere attributed to their high surface-to-volume ratio.