Data di Pubblicazione:
1996
Abstract:
a-Si:H/c-Si heterojunction diodes were produced by PECVD with varying amorphous silicon layer thickness and hydrogen dilution of the gas phase. An accurate determination of the growth rate also in the initial stages of the deposition was made possible by an original chemical method based on the dissolution of the films followed by spectroscopical analysis of the obtained solution. The electrical characterization of the diodes confirms the generation - recombination - multitunneling nature of the transport. Although H-2 dilution is important, however, beyond a certain level it is detrimental for the junction quality, probably due to the transition to a microcrystalline phase deposition. Solar cells were also produced, the best results being an open circuit voltage of 610 mV and an intrinsic efficiency of 14.2%.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Elenco autori:
Rizzoli, Rita; Summonte, Caterina
Link alla scheda completa:
Titolo del libro:
AMORPHOUS SILICON TECHNOLOGY - 1996
Pubblicato in: