An MOCVD route to barium borate thin films from a barium hydro-tri(1-pyrazolyl)borate single-source precursor

BaB2O4 thin films are deposited by metal-organic (MO)CVD using the barium(II) hydro-tri(1-pyrazolyl)borate, Ba[BH(PZ)(3)](2), complex, that is tested for the first time as a single-source precursor for the deposition of barium borate films. The related thermal analysis data reveal good volatility and high thermal stability with a low residue upon sublimation, despite the relatively high melting point (298.2 degrees C). Different BaB2O4 phases can be obtained depending on deposition temperatures. Films, deposited on Al2O3 (0001) substrates, are structurally and morphologically characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS).