Highly oriented V2O5 nanocrystalline thin films by Plasma-Enhanced Chemical Vapor Deposition

Plasma-enhanced chemical vapor deposition of vanadium pentoxide thin films from a vanadyl(IV) beta-diketonate compound has been performed in a low-pressure reactor under different operating conditions. The effect of various parameters, such as the flow rates of the carrier and reactive gas and the substrate temperatures, on films composition, microstructure, and morphology was investigated in detail. Controlled variations of the synthesis conditions allowed a fine modulation of the sample properties, as shown by XRD and AFM analyses. In particular, at 200 °C and moderate oxygen flow, nanophasic V2O5 with a strong (001) preferential orientation could be easily obtained. The composition and purity of the films are studied by XPS and SIMS analyses, with special regard to filmsubstrate interdiffusion phenomena. Optical properties of the films are also investigated.