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Structural and electronic properties of thin Ni layers on Cu(111) as investigated by ARPES, STM and GIXD

Articolo
Data di Pubblicazione:
2006
Abstract:
The growth and the crystalline and electronic structure of Ni deposited on single crystalline Cu(111) were studied by scanning tunnelling microscopy (STM), grazing incidence X-ray diffraction (GIXD) and angle-resolved photoemission spectroscopy (ARPES). In the early stages of growth monoatomic-high flat Ni islands, partially covered by Cu migrating from the surface, are observed. Starting from a pseudomorphic epitaxial relationship the in-plane lattice parameter progressively relaxes with increasing coverage. For a 20 monolayer (ML) thick deposit the in-plane lattice parameter is still found halfway between the bulk Ni and Cu lattice parameters. ARPES data also rule out the layer-by-layer growth and provide the values of the Ni exchange splitting. (c) 2006 Elsevier B.V. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
NICKEL MONOLAYERS; ULTRATHIN FILMS; SURFACE; TE; COPPER
Elenco autori:
Rossi, Giorgio; Vobornik, Ivana; Fujii, Jun
Autori di Ateneo:
FUJII JUN
VOBORNIK IVANA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/162770
Pubblicato in:
SURFACE SCIENCE
Journal
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URL

http://www.sciencedirect.com/science/article/pii/S0039602806004304
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