Erratum: Damage profiles in as-implanted (100) Si crystals: Strain by X-ray diffractometry versus interstitials by RBS-channeling (Nucl. Instr. and Meth. B vol 120, pg 64, 1996)

Refers To R. Nipoti, M. Servidori, M. Bianconi, S. Milita Damage profiles in as-implanted ?100? Si crystals: strain by X-ray diffractometry versus interstitials by RBS-channeling Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Volume 120, Issues 1-4, 2 December 1996, Pages 64-67