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Stoichiometry-Dependent Chemical Activity of Supported MgO(100) Films

Articolo
Data di Pubblicazione:
2011
Abstract:
Here, we show that the stoichiometry and, consequently, the chemical activity toward hydroxylation of MgO(100) films grown by reactive deposition on Ag(100) strongly depend on the O(2) partial pressure during film growth. Oxygen-deficient films undergo dramatic relative oxygen uptake either by exposure to a partial pressure of water vapor or by aging in vacuum for a sufficiently long time. Conversely, on stoichiometric monolayer MgO islands, photoemission analysis of the O Is level and scanning tunneling microscopy images are consistent with the prediction that dissociative adsorption of water occurs only at the borders of the islands.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
MGO FILMS; OXIDE SURFACES; ELECTRONIC-STRUCTURE; WATER DISSOCIATION; AG(100)
Elenco autori:
Rocca, MARIO AGOSTINO; Vattuone, Luca; Savio, Letizia; Smerieri, Marco
Autori di Ateneo:
SAVIO LETIZIA
SMERIERI MARCO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/172840
Pubblicato in:
JOURNAL OF PHYSICAL CHEMISTRY. A, MOLECULES, SPECTROSCOPY, KINETICS, ENVIRONMENT, & GENERAL THEORY
Journal
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URL

http://pubs.acs.org/doi/abs/10.1021/jp200069u
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