Skip to Main Content (Press Enter)

Logo CNR
  • ×
  • Home
  • Persone
  • Pubblicazioni
  • Strutture
  • Competenze

UNI-FIND
Logo CNR

|

UNI-FIND

cnr.it
  • ×
  • Home
  • Persone
  • Pubblicazioni
  • Strutture
  • Competenze
  1. Pubblicazioni

Femtosecond laser and reactive ion etching based treatments for nanoscale surface texturing of porous silicon carbide

Contributo in Atti di convegno
Data di Pubblicazione:
2018
Abstract:
With the aim of tuning the optical properties of SiC selective solar absorbers, we investigate the surface micro/nano-texturing of porous silicon carbide by using two approaches, namely i) the femtosecond laser treatment and ii) the fluorine based reactive ion etching. It is found that both the techniques are capable of inducing significant surface morphology modification inducing a substantial roughening. The surface features produced are found to be tunable by tailoring the main process parameters, i.e. translation speed and pulse repetition rate for laser treatment, and RF-power, gas pressure and gas mixture for the reactive ion etching process.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Keywords:
femtosecond laser; reactive ion etching; silicon carbide; solar absorbers
Elenco autori:
Orlando, Stefano; Trucchi, DANIELE MARIA; Notargiacomo, Andrea; Girolami, Marco; Bellucci, Alessandro; Pea, Marialilia
Autori di Ateneo:
BELLUCCI ALESSANDRO
GIROLAMI MARCO
NOTARGIACOMO ANDREA
ORLANDO STEFANO
PEA MARIALILIA
TRUCCHI DANIELE MARIA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/356245
  • Dati Generali

Dati Generali

URL

https://ieeexplore.ieee.org/abstract/document/8626393
  • Utilizzo dei cookie

Realizzato con VIVO | Designed by Cineca | 26.5.0.0 | Sorgente dati: PREPROD (Ribaltamento disabilitato)