Data di Pubblicazione:
2008
Abstract:
NROM type non-volatile memories, having information charge
stored in traps in silicon nitride layer, were subjected to different
radiation sources in order to ascertain the radiation hardness.
Fundamental device parameters, such as threshold voltage shift
and current leakages were studied as function of the accumulated
dose for gamma (60Co) and Boron ions irradiations to emulate real
radiation environments for space and avionics applications.
Radiation tolerance of NROM cells was registered with a
pronounced degradation for doses exceeding 50 Krad and 1x1010
B/cm2 for gamma and Boron ions irradiations respectively.
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Lombardo, SALVATORE ANTONINO; Libertino, Sebania; Corso, Domenico
Link alla scheda completa:
Pubblicato in: