An x-ray photoelectron spectra and atomic force microscopy characterization of silica substrates engineered with a covalently assembled siloxane monolayer

Silica substrates were functionalized with a covalent 4-ClCH2C6H4SiCl3 monolayer. Additional covalent bonding of appropriate functional molecules to the silylated substrates was further achieved. The surface chemical characterization was carried out by angle resolved x-ray photoelectron measurements. Moreover, surface morphological characterizations were performed by atomic force microscopy measurements. Present results provide step by step information on the covalently linked monolayer during the synthetic procedure.