Holograms for the Generation of Vortex States with L= 500h Fabricated by Electron Beam Lithography

Electron Vortex beam with high quanta of OAM are interesting for their magnetic properties and to explore the transition between quantum and classical definition of Orbital Angular Momentum. This justifies the technological effort to produce increasingly complicated hologram encoding for such complicated case. While so far the technology of hologram fabrication was based on FIB patterning on SiN with a small exception we are exploring the possibility to produce the highest quanta of OAM ever built by using Electron Beam Lithography. We demonstrate here the case of a vortex beam with nominal OAM L=500 ?. One extremely interesting problem is that the generation and characterization of such beams is indubitably challenging since the number of pixel necessary for the sampling of the vortex structure is typically very high.