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Automatic Langmuir probe measurement in a magnetron sputtering system

Articolo
Data di Pubblicazione:
1999
Abstract:
The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma produced by a magnetron sputtering device. The magnetic field has been mapped by measuring the axial and radial components with Hall probes. The plasma parameters have been measured by a diagnostic system consisting of several Langmuir probes with different collecting areas that can be positioned by a linear translator. The automatic analysis system allows one to take into account non-saturation of the ion current due to sheath thickness variation. The Langmuir probes have been used in various conditions of magnetic field and source power with a gas filling pressure of 1 Pa. It has been found that the diagnostic system gives reliable measurements of the plasma parameters in static and inhomogeneous magnetic fields. (C) 1999 Elsevier Science S.A. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Electron temperature; Ion density; Langmuir probe; Magnetron sputtering
Elenco autori:
Pomaro, Nicola; Martines, Emilio; Antoni, Vanni; Tramontin, Lucia; Serianni, Gianluigi; Spolaore, Monica
Autori di Ateneo:
POMARO NICOLA
SERIANNI GIANLUIGI
SPOLAORE MONICA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/212418
Pubblicato in:
SURFACE & COATINGS TECHNOLOGY
Journal
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http://ac.els-cdn.com/S025789729900122X/1-s2.0-S025789729900122X-main.pdf?_tid=95d5a416-34ed-11e3-b070-00000aacb361&acdnat=1381768257_b2cf21f88e0eb8eb532fc4325a291914
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