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Migration of atomic hydrogen in crystalline and amorphous SiO2: a molecular dynamics study

Academic Article
Publication Date:
1997
abstract:
We present a theoretical investigation on the diffusion of atomic hydrogen in crystalline as well as amorphous silicon dioxide. By means of molecular dynamics simulations, we compute the activation energy (eV) and the diffusivity prefactor (cm(2)/s) for the migration process of atomic hydrogen and describe the topology of the migration path in relation to the symmetry of the host structure. We also describe the trap-limited diffusion process in the amorphous phase.
Iris type:
01.01 Articolo in rivista
Keywords:
Alkali-metal ions; Structural transformation; Silicon; Diffusion; Electrodiffusion
List of contributors:
Trioni, MARIO ITALO
Authors of the University:
TRIONI MARIO ITALO
Handle:
https://iris.cnr.it/handle/20.500.14243/211741
Published in:
JOURNAL OF NON-CRYSTALLINE SOLIDS
Journal
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URL

http://www.sciencedirect.com/science/article/pii/S002230939700118X
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