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Migration of atomic hydrogen in crystalline and amorphous SiO2: a molecular dynamics study

Articolo
Data di Pubblicazione:
1997
Abstract:
We present a theoretical investigation on the diffusion of atomic hydrogen in crystalline as well as amorphous silicon dioxide. By means of molecular dynamics simulations, we compute the activation energy (eV) and the diffusivity prefactor (cm(2)/s) for the migration process of atomic hydrogen and describe the topology of the migration path in relation to the symmetry of the host structure. We also describe the trap-limited diffusion process in the amorphous phase.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Alkali-metal ions; Structural transformation; Silicon; Diffusion; Electrodiffusion
Elenco autori:
Trioni, MARIO ITALO
Autori di Ateneo:
TRIONI MARIO ITALO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/211741
Pubblicato in:
JOURNAL OF NON-CRYSTALLINE SOLIDS
Journal
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http://www.sciencedirect.com/science/article/pii/S002230939700118X
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