Skip to Main Content (Press Enter)

Logo CNR
  • ×
  • Home
  • Persone
  • Pubblicazioni
  • Strutture
  • Competenze

UNI-FIND
Logo CNR

|

UNI-FIND

cnr.it
  • ×
  • Home
  • Persone
  • Pubblicazioni
  • Strutture
  • Competenze
  1. Pubblicazioni

Iso-concentration study of atomistic mechanism of B diffusion in Si

Articolo
Data di Pubblicazione:
2007
Abstract:
B diffuses in crystalline Si by reacting with Si self-interstitial (I) with a frequency g, forming a BI complex that can migrate for an average length lambda. We experimentally measured both g and lambda as a function of the hole concentration p by means of iso-concentration experiments on B delta-layers both under p- and n-doping conditions. On the basis of these data, we propose a comprehensive model that fixes the interplay among free charge, I and BI charge states that determines the B diffusion. Pairing effect with donors was also considered. (C) 2007 Elsevier B.V. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
TRANSIENT ENHANCED DIFFUSION; ION-IMPLANTED BORON; PREAMORPHIZED SILICON; POINT-DEFECTS
Elenco autori:
Priolo, Francesco; DE SALVADOR, Davide; Carnera, Alberto; Bisognin, Gabriele; Napolitani, Enrico; Impellizzeri, Giuliana; Mirabella, Salvatore
Autori di Ateneo:
IMPELLIZZERI GIULIANA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/170998
Pubblicato in:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. SECTION B, BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Journal
  • Utilizzo dei cookie

Realizzato con VIVO | Designed by Cineca | 26.5.0.0 | Sorgente dati: PREPROD (Ribaltamento disabilitato)