Data di Pubblicazione:
2007
Abstract:
B diffuses in crystalline Si by reacting with Si self-interstitial (I) with a frequency g, forming a BI complex that can migrate for an average length lambda. We experimentally measured both g and lambda as a function of the hole concentration p by means of iso-concentration experiments on B delta-layers both under p- and n-doping conditions. On the basis of these data, we propose a comprehensive model that fixes the interplay among free charge, I and BI charge states that determines the B diffusion. Pairing effect with donors was also considered. (C) 2007 Elsevier B.V. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
TRANSIENT ENHANCED DIFFUSION; ION-IMPLANTED BORON; PREAMORPHIZED SILICON; POINT-DEFECTS
Elenco autori:
Priolo, Francesco; DE SALVADOR, Davide; Carnera, Alberto; Bisognin, Gabriele; Napolitani, Enrico; Impellizzeri, Giuliana; Mirabella, Salvatore
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