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Photoprocesses in organometallics

Articolo
Data di Pubblicazione:
1990
Abstract:
Recently, among other organometallics, metal alkyls have gained relevant importance as precursor compounds in the area of laser-CVD of metal film and microstructures. A great deal of attention has been devoted to the study of their visible/UV laser photochemistry with the aim to achieve the essential understanding needed to control the photoreaction. Several spectroscopic techniques have been used to monitor the photolysis of a variety of volatile metal alkyls and to characterize the energy distribution of the nascent fragments. In many cases a detailed understanding of the process dynamics has been achieved. The influence of UV or visible radiation on molecule-substrate systems has been investigated by revealing the modifications induced in the adsorbate by surface analysis techniques in UHV environments. © 1990.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Chemical Reactions--Reaction Kinetics; Laser Beams--Applications; Organometallics--Photolysis; Surfaces--Spectroscopic Analysis; Metal Alkyl Organometallics; Organometallic Photochemistry; Organometallic Precursor Photolysis; Photolytic Laser Chemical Vapor Deposition; Films
Elenco autori:
Larciprete, Rosanna
Autori di Ateneo:
LARCIPRETE ROSANNA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/199541
Pubblicato in:
APPLIED SURFACE SCIENCE
Journal
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