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Optical layout of BACH: a Beamline for Advanced diCHroism at ELETTRA

Conference Paper
Publication Date:
2001
abstract:
Here we report the general layout of the beamline and concentrate our attention on the characteristics of the optical elements as well as on the optical performances (monochromator's resolving powers and efficiencies, flux and spot dimensions) of the beamline.
Iris type:
04.01 Contributo in Atti di convegno
List of contributors:
Parmigiani, Fulvio; Finazzi, Marco; Zangrando, Marco
Authors of the University:
ZANGRANDO MARCO
Handle:
https://iris.cnr.it/handle/20.500.14243/219352
Book title:
Soft X-Ray and EUV Imaging Systems
Published in:
PROCEEDINGS OF SPIE
Series
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