Optical layout of BACH: a Beamline for Advanced diCHroism at ELETTRA

Contributo in Atti di convegno
Data di Pubblicazione:
2001
Abstract:
Here we report the general layout of the beamline and concentrate our attention on the characteristics of the optical elements as well as on the optical performances (monochromator's resolving powers and efficiencies, flux and spot dimensions) of the beamline.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Elenco autori:
Autori di Ateneo:
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/219352
Titolo del libro:
Soft X-Ray and EUV Imaging Systems
Pubblicato in:
PROCEEDINGS OF SPIE
Series