Clustering of ultra-low-energy implanted boron in silicon during activation annealing

Academic Article
Publication Date:
2000
Iris type:
01.01 Articolo in rivista
Keywords:
PHYSICAL-MECHANISMS; DIFFUSION
List of contributors:
Authors of the University:
Handle:
https://iris.cnr.it/handle/20.500.14243/178036
Published in:
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Journal