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Piezoelectric AlN films for SAW devices applications

Conference Paper
Publication Date:
1993
abstract:
Polycrystalline AlN films with the c-axis oriented normal to the substrate surface, were deposited by RF reactive diode magnetron sputtering on fused quartz, silicon and sapphire. The films were characterized as to their morphology, optic and acoustic characteristics. The phase velocity dispersion curves vs normalized film thickness were evaluated theoretically together with the electromechanical coupling coefficient for the four different interdigital transducers geometries. The theoretical results were compared experimental values. Results showd AlN for applications to SAW devices.
Iris type:
04.01 Contributo in Atti di convegno
Keywords:
SAW; AlN; piezoelectricity; thin film; sputtering
List of contributors:
Verardi, Patrizio; Verona, Enrico; Caliendo, Cinzia
Authors of the University:
CALIENDO CINZIA
Handle:
https://iris.cnr.it/handle/20.500.14243/178022
Published in:
PROCEEDINGS-IEEE ULTRASONICS SYMPOSIUM
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http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=339578
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