Publication Date:
1993
abstract:
Polycrystalline AlN films with the c-axis oriented
normal to the substrate surface, were deposited by RF
reactive diode magnetron sputtering on fused quartz,
silicon and sapphire. The films were characterized as
to their morphology, optic and acoustic characteristics.
The phase velocity dispersion curves vs normalized
film thickness were evaluated theoretically together
with the electromechanical coupling coefficient for the
four different interdigital transducers geometries. The
theoretical results were compared
experimental values. Results showd AlN
for applications to SAW devices.
Iris type:
04.01 Contributo in Atti di convegno
Keywords:
SAW; AlN; piezoelectricity; thin film; sputtering
List of contributors:
Verardi, Patrizio; Verona, Enrico; Caliendo, Cinzia
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