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Piezoelectric AlN films for SAW devices applications

Contributo in Atti di convegno
Data di Pubblicazione:
1993
Abstract:
Polycrystalline AlN films with the c-axis oriented normal to the substrate surface, were deposited by RF reactive diode magnetron sputtering on fused quartz, silicon and sapphire. The films were characterized as to their morphology, optic and acoustic characteristics. The phase velocity dispersion curves vs normalized film thickness were evaluated theoretically together with the electromechanical coupling coefficient for the four different interdigital transducers geometries. The theoretical results were compared experimental values. Results showd AlN for applications to SAW devices.
Tipologia CRIS:
04.01 Contributo in Atti di convegno
Keywords:
SAW; AlN; piezoelectricity; thin film; sputtering
Elenco autori:
Verardi, Patrizio; Verona, Enrico; Caliendo, Cinzia
Autori di Ateneo:
CALIENDO CINZIA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/178022
Pubblicato in:
PROCEEDINGS-IEEE ULTRASONICS SYMPOSIUM
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http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=339578
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