Plasma enhanced chemical vapor deposition of nanocrystalline silicon films from SiF4-H2-He at low temperature

Abstract
Publication Date:
1998
Iris type:
04.02 Abstract in Atti di convegno
List of contributors:
Handle:
https://iris.cnr.it/handle/20.500.14243/122197
Book title:
Abstracts European Mat. Res. Soc. Spring Meeting (E-MRS)